Electron postgrowth irradiation of platinum-containing nanostructures grown by electron-beam-induced deposition from Pt(PF3)4

The material grown in a scanning electron microscope by electron beam-induced deposition (EBID) using Pt(PF3)4 precursor is shown to be electron beam sensitive. The effects of deposition time and postgrowth electron irradiation on the microstructure and resistivity of the deposits were assessed by transmission electron microscopy, selected area...

High-resistivity nanogranular Co–Al–O films for high-frequency applications

This work presents a series of high-resistivity nanogranular Co–Al–O films with maximum resistivity of ? 110?m??cm. The films were deposited using pulsed dc reactive sputtering of a Co72Al28 target in an oxygen/argon ambient. The samples were characterized by scanning electron microscopy (SEM), M-H loop measurements, and s-parameter measurements...

Stress in sputter-deposited Cr films: Influence of Ar pressure

We studied the tensile stress and grain-width evolution in sputter-deposited Cr films with thickness from 20?nm to 2.7??m. Films were deposited in an industrial Hauzer 750 physical vapor deposition machine at 50–80?°C. The films exhibited a columnar microstructure. A power law behavior of the tensile stress as well as of the average grain width...

Photolithographic patterning of the charge-density-wave conductor Rb 0.30 MoO 3

Orientation of the charge-density-wave chains in thin films of Rb 0.30 MoO 3