Joint Research on Scatterometry and AFM Wafer Metrology

Joint Research on Scatterometry and AFM Wafer Metrology

Bodermann, B.
Buhr, E.
Danzebrink, H.U.
Bär, M.
Scholze, F.
Krumrey, M.
Wurm, M.
Klapetek, P.
Hansen, P.E.
Korpelainen, V.
Van Veghel, M.
Yacoot, A.
Siitonen, S.
El Gawhary, O.
Burger, S.
Saastamoinen, T.

Applied Sciences

IST/Imaging Science and Technology

2011-05-23

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers.

scatterometry
CD metrology
AFM
reference standard
rigorous modelling
inverse diffraction problem

http://resolver.tudelft.nl/uuid:46fb7c80-6fb7-4d4b-ab4e-aaf01bb0ba25

https://doi.org/10.1063/1.3657910

American Institute of Physics

978-0-7354-0965-1

http://link.aip.org/link/doi/10.1063/1.3657910

AIP Conference Proceedings 1395: Frontiers of Characterization and Metrology for Nanoelectronics: 2011, Grenoble, France, 23-26 May 2011

Institutional Repository

conference paper

(c) 2011 The Author(s)
American Institute of Physics