Print Email Facebook Twitter Low Temperature Fabrication of SiO2 Films Using Liquid Silicon Title Low Temperature Fabrication of SiO2 Films Using Liquid Silicon Author Xu, Y. Contributor Ishihara, R. (mentor) Faculty Electrical Engineering, Mathematics and Computer Science Department Microelectronics & Computer Engineering Date 2013-07-12 Abstract In this study, a new fabrication method was implemented to convert liquid silicon into silicon dioxide films through non-vacuum and roll-to-roll compatible processes at low temperatures. The electrical characterization of SiO2 films made from liquid silicon was reported for the first time. Subject print processliquid silicon To reference this document use: http://resolver.tudelft.nl/uuid:6579ee97-6315-48ed-a7f1-1fca8870f130 Embargo date 2014-12-31 Part of collection Student theses Document type master thesis Rights (c) 2013 Xu, Y. Files PDF Alice_Xu_master_thesis_Final.pdf 2.19 MB Close viewer /islandora/object/uuid:6579ee97-6315-48ed-a7f1-1fca8870f130/datastream/OBJ/view