Print Email Facebook Twitter Molecular simulation strategy for mechanical modeling of amorphous/porous low-dielectric constant materials Title Molecular simulation strategy for mechanical modeling of amorphous/porous low-dielectric constant materials Author Yuan, C.A. Van der Sluis, O. Zhang, G.Q. Ernst, L.J. Van Driel, W.D. Flower, A.E. Van Silfhout, B.R. Faculty Electrical Engineering, Mathematics and Computer Science Department Microelectronics & Computer Engineering Date 2008-02-14 Abstract We propose an amorphous/porous molecular connection network generation algorithm for simulating the material stiffness of a low-k material (SiOC:H). Based on a given concentration of the basic building blocks, this algorithm will generate an approximate and large amorphous network. The molecular topology is obtained by distributing these blocks randomly into a predefined framework. Subsequently, a structural relaxation step including local and global perturbations is applied to achieve the most likely stereochemical structure. Thus, the obtained mechanical properties of the low-k materials have been verified with the experimental data. Subject amorphous statemolecular dynamics methodpermittivityporous materialssilicon compounds To reference this document use: http://resolver.tudelft.nl/uuid:9e3cfaa2-7316-4c9d-9148-672c1dbad741 DOI https://doi.org/10.1063/1.2832639 Publisher American Institute of Physics ISSN 0003-6951 Source http://link.aip.org/link/APPLAB/v92/i6/p061909/s1 Source Applied Physics Letters, 92 (6), 2008 Part of collection Institutional Repository Document type journal article Rights (c) 2008 The Author(s); American Institute of Physics Files PDF Yuan_2008.pdf 482.25 KB Close viewer /islandora/object/uuid:9e3cfaa2-7316-4c9d-9148-672c1dbad741/datastream/OBJ/view