Print Email Facebook Twitter Raman spectroscopy as an on-line measurement technique in a laser-CVD reactor during production of Si sub 3N sub 4 Title Raman spectroscopy as an on-line measurement technique in a laser-CVD reactor during production of Si sub 3N sub 4 Author Tuinman, I.L. Veenstra, J. Marijnissen, J.C.M. Scarlett, B. Schoonman, J. Date 1996 Subject Silicon nitride Chemical vapor deposition Laser applications Raman spectroscopy Computational fluid dynamics Nucleation Mixing Powders Backscattering Computer simulation Gated detector system 804.2 (Inorganic Components) 802.2 (Chemical Reactions) 744.9 ( To reference this document use: http://resolver.tudelft.nl/uuid:d5917ad6-059a-4bdf-8f2f-a495adb8a738 ISSN 0021-8502 Source Journal of Aerosol Science 27(Suppl), S295-S296. (1996) Part of collection Institutional Repository Document type journal article Files PDF 865000.pdf 84.25 KB Close viewer /islandora/object/uuid:d5917ad6-059a-4bdf-8f2f-a495adb8a738/datastream/OBJ/view