Print Email Facebook Twitter A critical literature review of focused electron beam induced deposition Title A critical literature review of focused electron beam induced deposition Author Van Dorp, W.F. Hagen, C.W. Faculty Applied Sciences Department Imaging Science and Technology Date 2008-10-17 Abstract An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied (current density, acceleration voltage, scan patterns, etc.). Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and (as far as possible) interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters (such as the local precursor pressure) are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally, there is a limited understanding of the mechanism of electron induced precursor dissociation. In many cases, the deposit composition is not directly dependent on the stoichiometric composition of the precursor and the electron induced decomposition paths can be very different from those expected from calculations or thermal decomposition. The dissociation mechanism is one of the key factors determining the purity of the deposits and a better understanding of this process will help develop electron beam induced deposition into a viable nanofabrication technique. Subject dissociationelectron beam depositionelectron beam effectselectron beam focusingheatingnanotechnology To reference this document use: http://resolver.tudelft.nl/uuid:4a57b23f-e0a6-443a-894c-5d09c204ad45 DOI https://doi.org/10.1063/1.2977587 Publisher American Institute of Physics ISSN 0021-8979 Source http://link.aip.org/link/JAPIAU/v104/i8/p081301/s1 Source Journal of Applied Physics, 104 (8), 2008 Part of collection Institutional Repository Document type journal article Rights (c) 2008 Van Dorp, W.F.; Hagen, C.W.; American Institute of Physics Files PDF vanDorp_2008.pdf 3.57 MB Close viewer /islandora/object/uuid:4a57b23f-e0a6-443a-894c-5d09c204ad45/datastream/OBJ/view