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Emadi, A. (author), Grabarnik, S. (author), Wu, H. (author), De Graaf, R.F. (author), Wolffenbuttel, R.F. (author)
This paper presents spectral measurements using a linear variable optical filter. A LVOF has been developed for operation in the 530 nm–720 nm spectral band and has been fabricated in an IC-compatible process. The LVOF has been mounted on a CMOS camera. A Least Mean Square algorithm has been implemented to calculate the spectrum of light from...
journal article 2010
document
Emadi, A. (author), Grabarnik, S. (author), Wu, H. (author), De Graaf, G. (author), Hedsten, K. (author), Enoksson, P. (author), Correia, J.H. (author), Wolffenbuttel, R.F. (author)
This paper reports on the functional and spectral characterization of a microspectrometer based on a CMOS detector array covered by an IC-Compatible Linear Variable Optical Filter (LVOF). The Fabry-Perot LVOF is composed of 15 dielectric layers with a tapered middle cavity layer, which has been fabricated in an IC-Compatible process using resist...
conference paper 2010
document
Wu, H. (author), Grabarnik, S. (author), Emadi, A. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)
The spectral resolution of a MEMS-based IR microspectrometer critically depends on the thermal cross-talk between adjacent TE elements in the detector array. Thermal isolation between elements is realized by using bulk micromachining directly following CMOS processing. This paper reports on the characterization results of bridge-shaped TE...
journal article 2009
document
Emadi, A. (author), Wu, H. (author), Grabarnik, S. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)
This paper reports on the IC-compatible fabrication of vertically tapered optical layers for use in linear variable optical filters (LVOF). The taper angle is fully defined by a mask design. Only one masked lithography step is required for defining strips in a photoresist with trenches etched therein of a density varying along the length of the...
journal article 2009
document
Grabarnik, S. (author), Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)
A concept for a highly miniaturized spectrometer featuring a two-component design is presented. The first component is a planar chip that integrates an input slit and aberration-correcting diffraction grating with an image sensor and is fabricated using microelectromechanical systems (MEMS) technologies. Due to the fabrication in a simple MEMS...
journal article 2008
document
Grabarnik, S. (author), Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)
This paper reports on the development and validation of a new technology for the fabrication of variable line-spacing non-planar diffraction gratings to be used in compact spectrometers. The technique is based on the standard lithographic process commonly used for pattern transfer onto a flat substrate. The essence of the technology presented...
conference paper 2008
document
Grabarnik, S. (author), Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Vdovin, G. (author), Wolffenbutter, R.F. (author)
The design and performance of a highly miniaturized spectrometer fabricated using MEMS technologies are reported in this paper. Operation is based on an imaging diffraction grating. Minimizing fabrication complexity and assembly of the micromachined optical and electronic parts of the microspectrometer implies a planar design. It consists of two...
conference paper 2008
document
Grabarnik, S. (author), Emadi, A. (author), Wu, H. (author), De Graaf, G. (author), Vdovin, G. (author), Wolffenbuttel, R.F. (author)
journal article 2008
document
Wu, H. (author), Grabarnik, S. (author), Emadi, A. (author), De Graaf, G. (author), Wolffenbuttel, R.F. (author)
journal article 2008
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