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Mimoun, B.A.Z. (author), Pham, H.T.M. (author), Henneken, V. (author), Dekker, R. (author)
The authors have found that patterning polyimide coatings containing organosilane adhesion promoter using pure oxygen plasma resulted in a thin silicon-rich residue layer. They show in this paper that adding small amounts of fluorine-containing gas to the etching gas mixture is necessary in order to achieve residue-free polyimide plasma etching....
journal article 2013