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Thermochemical data of boron subphosphide
Thermochemical data of boron subphosphide
Particle-precipitation-aided chemical vapor deposition of titanium nitride
Particle-precipitation-aided chemical vapor deposition of titanium nitride
Thin-film components for lithium-ion batteries
Thin-film components for lithium-ion batteries
Reaction-bonded titanium nitride ceramics
Reaction-bonded titanium nitride ceramics
Solid oxide fuel cells operating on uniform mixtures of fuel and air
Solid oxide fuel cells operating on uniform mixtures of fuel and air
Laser-induced chemical vapour deposition of silicon carbonitride
Laser-induced chemical vapour deposition of silicon carbonitride
General Shock-Wave Equation of State for Solids
General Shock-Wave Equation of State for Solids
A kinetic study of titanium nitride chemical vapor deposition using nitrogen, hydrogen, and titanium tetrachloride
A kinetic study of titanium nitride chemical vapor deposition using nitrogen, hydrogen, and titanium tetrachloride
Chemical vapour infiltration of TiB2 and TiN in porous Al2O3
Chemical vapour infiltration of TiB2 and TiN in porous Al2O3
Vapour-phase synthesis of titanium nitride powder
Vapour-phase synthesis of titanium nitride powder
NOx sensing characteristics of Bi2Sr2CaCu2O8+x and Bi2Sr2CuO6+x films
NOx sensing characteristics of Bi2Sr2CaCu2O8+x and Bi2Sr2CuO6+x films
Plasma-Enhanced Chemical-Vapor-Deposition of Boron-Nitride onto Inp
Plasma-Enhanced Chemical-Vapor-Deposition of Boron-Nitride onto Inp
Gas-to-particle conversion in the particle precipitation-aided chemical vapor deposition process. I: Synthesis of the binary compound titanium nitride. The role of aerosols in materials processing
Gas-to-particle conversion in the particle precipitation-aided chemical vapor deposition process. I: Synthesis of the binary compound titanium nitride. The role of aerosols in materials processing
Kinetics of tungsten low-pressure chemical-vapor deposition using WF<subscript>6 and SiH<subscript>4 studied by in situ growth-rate measurements
Kinetics of tungsten low-pressure chemical-vapor deposition using WF6 and SiH4 studied by in situ growth-rate measurements
Kinetics and mechanism of tungsten LPCVD using tungsten hexafluoride and silane studied by in-situ growth rate measurements
Kinetics and mechanism of tungsten LPCVD using tungsten hexafluoride and silane studied by in-situ growth rate measurements
Chemical vapor deposition of titanium diboride using boron tribromide, titanium tetrachloride, and hydrogen
Chemical vapor deposition of titanium diboride using boron tribromide, titanium tetrachloride, and hydrogen
Chemical vapor deposition of thin films of mixed conductors
Chemical vapor deposition of thin films of mixed conductors
Charge transport phenomena in thin-film cathodes
Charge transport phenomena in thin-film cathodes
Deposition of boron nitride by plasma enhanced CVD using borane amine
Deposition of boron nitride by plasma enhanced CVD using borane amine
Deposition of cubic boron monophosphide from tribromoborane and tribromophosphine: A reaction mechanism
Deposition of cubic boron monophosphide from tribromoborane and tribromophosphine: A reaction mechanism
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