"uuid","repository link","title","author","contributor","publication year","abstract","subject topic","language","publication type","publisher","isbn","issn","patent","patent status","bibliographic note","access restriction","embargo date","faculty","department","research group","programme","project","coordinates" "uuid:7da622ad-f151-41a4-aa40-dd87cb00ca45","http://resolver.tudelft.nl/uuid:7da622ad-f151-41a4-aa40-dd87cb00ca45","Review Article: Recommended reading list of early publications on atomic layer deposition - Outcome of the ""virtual Project on the History of ALD""","Ahvenniemi, Esko (Aalto University); Akbashev, Andrew R. (Stanford University); Ali, Saima (Aalto University); Bechelany, Mikhael (ENS-PSL Research University & CNRS); Berdova, Maria (University of Twente); Boyadjiev, Stefan (Bulgarian Academy of Sciences); Cameron, David C. (Masaryk University); Chen, R. (TU Delft Railway Engineering; School of Mechanical Science and Engineering; Huazhong University of Science and Technology); Chubarov, Mikhail (Université Grenoble Alpes); Cremers, Veronique (Universiteit Gent); Devi, Anjana (Center for Interface-Dominated High Performance Materials); Drozd, Viktor (Institute of Translational Biomedicine); Elnikova, Liliya (Institute for Theoretical and Experimental Physics); Gottardi, Gloria (Fondazione Bruno Kessler); Grigoras, Kestutis (VTT Technical Research Center of Finland); Hausmann, Dennis M. (Lam Research Corporation); Hwang, Cheol Seong (Seoul National University); Jen, Shih Hui (Globalfoundries); Kallio, Tanja (Aalto University); Kanervo, Jaana (Aalto University; Åbo Akademi University); Khmelnitskiy, Ivan (Saint Petersburg Electrotechnical University LETI); Kim, Do Han (Massachusetts Institute of Technology); Klibanov, Lev (Techinsights); Koshtyal, Yury (Ioffe Institute); Krause, A. Outi I (Aalto University); Kuhs, Jakob (Universiteit Gent); Kärkkänen, Irina (SENTECH Instruments GmbH); Kääriäinen, Marja Leena (NovaldMedical Ltd. Oy); Kääriäinen, Tommi (Viikki Biocenter 1; NovaldMedical Ltd. Oy); Lamagna, Luca (STMicroelectronics); Łapicki, Adam A. (Seagate Technology (Ireland)); Leskelä, Markku (Viikki Biocenter 1); Lipsanen, Harri (Aalto University); Lyytinen, Jussi (Aalto University); Malkov, Anatoly (St. Petersburg State Institute of Technology); Malygin, Anatoly (St. Petersburg State Institute of Technology); Mennad, Abdelkader (CDER); Militzer, Christian (Technische Universität Chemnitz); Molarius, Jyrki (Summa Semiconductor Oy); Norek, Małgorzata (Military University of Technology); Özgit-Akgün, Çaǧla (ASELSAN Inc.); Panov, Mikhail (Saint Petersburg Electrotechnical University LETI); Pedersen, Henrik (Linköping University); Piallat, Fabien (KOBUS); Popov, Georgi (Viikki Biocenter 1); Puurunen, Riikka L. (VTT Technical Research Center of Finland); Rampelberg, Geert (Universiteit Gent); Ras, Robin H A (Aalto University); Rauwel, Erwan (Tallinn University of Technology); Roozeboom, Fred (Eindhoven University of Technology; TNO); Sajavaara, Timo (University of Jyväskylä); Salami, Hossein (University of Maryland); Savin, Hele (Aalto University); Schneider, Nathanaelle (Institut Photovoltaique d'Ile-de-France (IPVF) - Site Antony; Institut de recherche et développement sur l’énergie photovoltaïque (IRDEP-CNRS)); Seidel, Thomas E. (Seitek50); Sundqvist, Jonas (Fraunhofer-Institut für Keramische Technologien und Systeme IKTS); Suyatin, Dmitry B. (Lund University); Törndahl, Tobias (Uppsala University); van Ommen, J.R. (TU Delft ChemE/Product and Process Engineering); Wiemer, Claudia (IMM-CNR); Ylivaara, Oili M E (VTT Technical Research Center of Finland); Yurkevich, Oksana (Immanuel Kant Baltic Federal University)","","2017","Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name ""molecular layering"" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.","","en","review","","","","","","","","","","","Railway Engineering","","",""