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Ellis, J.D. (author), Meskers, A.J.H. (author), Spronck, J.W. (author), Munnig Schmidt, R.H. (author)
Displacement interferometry is widely used for accurately characterizing nanometer and subnanometer displacements in many applications. In many modern systems, fiber delivery is desired to limit optical alignment and remove heat sources from the system, but fiber delivery can exacerbate common interferometric measurement problems, such as...
journal article 2011
document
Ellis, Jonathan David (author)
This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.
doctoral thesis 2010
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Ellis, J.D. (author), Joo, K.N. (author), Spronck, J.W. (author), Munnig Schmidt, R.H. (author)
We describe two different, double-sided interferometer designs for measuring material stability. Both designs are balanced interferometers where the only optical path difference is the sample and the reference beams are located within the interferometer. One interferometer is a double-pass design, whereas the other is a single-pass system. Based...
journal article 2009
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Joo, K.N. (author), Ellis, J.D. (author), Spronck, J.W. (author), Van Kan, P.J.M. (author), Munnig Schmidt, R.H. (author)
We describe a simple heterodyne laser interferometer that has subnanometer periodic errors and is applicable to industrial fields. Two spatially separated beams can reduce the periodic errors, and the use of a right-angle prism makes the optical configuration much simpler than previous interferometers. Moreover, the optical resolution can be...
journal article 2009
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