Searched for:
(1 - 10 of 10)
document
Braat, J.J.M. (author), Janssen, A.J.E.M. (author)
Various authors have presented the aberration function of an optical system as a power series expansion with respect to the ray coordinates in the exit pupil and the coordinates of the intersection point with the image field of the optical system. In practical applications, for reasons of efficiency and accuracy, an expansion with the aid of...
journal article 2013
document
Van Haver, S. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Janssen, O.T.A. (author), Pereira, S.F. (author)
We present details of a novel imaging algorithm based on the extended Nijboer–Zernike (ENZ) theory of diffraction. We derive integral expressions relating the electric field distribution in the entrance pupil of an optical system to the electric field in its focal region. The evaluation of these integrals is made possible by means of a highly...
journal article 2009
document
Van Haver, S. (author), Janssen, O.T.A. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Urbach, H.P. (author), Pereira, S.F. (author)
In this paper we introduce a new mask imaging algorithm that is based on the source point integration method (or Abbe method). The method presented here distinguishes itself from existing methods by exploiting the through-focus imaging feature of the Extended Nijboer-Zernike (ENZ) theory of diffraction. An introduction to ENZ-theory and its...
conference paper 2008
document
Janssen, O.T.A. (author), Van Haver, S. (author), Janssen, A.J.E.M. (author), Braat, J.J.M. (author), Urbach, H.P. (author), Pereira, S.F. (author)
Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction. We show that the efficiency of a mask imaging algorithm, derived from this theory, can be increased. By adjusting the basic Finite Difference Time Domain (FDTD) algorithm, we can calculate the near field of isolated mask structures efficiently,...
conference paper 2008
document
Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Matsuyama, T. (author), Noda, T. (author)
Phase Measurement Interferometers (PMI) are widely used during the manufacturing process of high quality lenses. Although they have an excellent reproducibility and sensitivity, the set-up is expensive and the accuracy of the measurement needs to be checked frequently. This paper discusses an alternative lens metrology method that is based on an...
conference paper 2006
document
Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author)
journal article 2006
document
Braat, J.J.M. (author), Dirksen, P. (author), Janssen, A.J.E.M. (author), Van Haver, S. (author), Van de Nes, A.S. (author)
The judgment of the imaging quality of an optical system can be carried out by examining its through-focus intensity distribution. It has been shown in a previous paper that a scalar-wave analysis of the imaging process according to the extended Nijboer–Zernike theory allows the retrieval of the complex pupil function of the imaging system,...
journal article 2005
document
Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwesteijn, A. (author)
conference paper 2005
document
Braat, J.J.M. (author), Dirksen, P. (author), Janssen, A.J.E.M. (author), Van de Nes, A.S. (author)
Poster presentation with Philips Research Laboratories
journal article 2004
document
Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Kwinten, H. (author), Van Steenwinckel, D. (author)
This study presents an experimental method to determine the resist parameters that are at the origin of a general blurring of the projected aerial image. The resist model includes the effects of diffusion in the horizontal plane and a second cause for image blur that originates from a stochastic variation of the focus parameter. The used...
conference paper 2004
Searched for:
(1 - 10 of 10)