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Van Haver, S. (author), Janssen, O.T.A. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Urbach, H.P. (author), Pereira, S.F. (author)
In this paper we introduce a new mask imaging algorithm that is based on the source point integration method (or Abbe method). The method presented here distinguishes itself from existing methods by exploiting the through-focus imaging feature of the Extended Nijboer-Zernike (ENZ) theory of diffraction. An introduction to ENZ-theory and its...
conference paper 2008
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Janssen, O.T.A. (author), Van Haver, S. (author), Janssen, A.J.E.M. (author), Braat, J.J.M. (author), Urbach, H.P. (author), Pereira, S.F. (author)
Results are presented of mask imaging using the Extended Nijboer-Zernike (ENZ) theory of diffraction. We show that the efficiency of a mask imaging algorithm, derived from this theory, can be increased. By adjusting the basic Finite Difference Time Domain (FDTD) algorithm, we can calculate the near field of isolated mask structures efficiently,...
conference paper 2008
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Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Matsuyama, T. (author), Noda, T. (author)
Phase Measurement Interferometers (PMI) are widely used during the manufacturing process of high quality lenses. Although they have an excellent reproducibility and sensitivity, the set-up is expensive and the accuracy of the measurement needs to be checked frequently. This paper discusses an alternative lens metrology method that is based on an...
conference paper 2006
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Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwesteijn, A. (author)
conference paper 2005
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Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Kwinten, H. (author), Van Steenwinckel, D. (author)
This study presents an experimental method to determine the resist parameters that are at the origin of a general blurring of the projected aerial image. The resist model includes the effects of diffusion in the horizontal plane and a second cause for image blur that originates from a stochastic variation of the focus parameter. The used...
conference paper 2004
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