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Grachev, S.Y. (author), Tichelaar, F.D. (author), Janssen, G.C.A.M. (author)
We studied the tensile stress and grain-width evolution in sputter-deposited Cr films with thickness from 20?nm to 2.7??m. Films were deposited in an industrial Hauzer 750 physical vapor deposition machine at 50–80?°C. The films exhibited a columnar microstructure. A power law behavior of the tensile stress as well as of the average grain width...
journal article 2005