Searched for: +
(1 - 1 of 1)
document
Dorsman, R. (author)
Many processes exist in which a thin film is deposited from the gas phase, e.g. Chemical Vapor Deposition (CVD). These processes are operated at ever decreasing reactor operating pressures and with ever decreasing wafer feature dimensions, reaching into the rarefied flow regime. As numerical simulation tools are frequently used to design and...
doctoral thesis 2007