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Marinescu, O. (author), Bociort, F. (author)
The merit function space of mirror systems for EUV lithography is studied. Local minima situated in a multidimensional merit function space are connected via links that contain saddle points and form a network. In this work we present the first networks for EUV lithographic objectives and discuss how these networks change when control parameters...
conference paper 2005
Marinescu, O. (author), Bociort, F. (author), Braat, J. (author)
When Extreme Ultraviolet mirror systems having several high-order aspheric surfaces are optimized, the configurations often enter into highly unstable regions of the parameter space. Small changes of system parameters lead then to large changes in ray paths, and therefore optimization algorithms crash because certain sssumptions upon which they...
conference paper 2004