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Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Matsuyama, T. (author), Noda, T. (author)
Phase Measurement Interferometers (PMI) are widely used during the manufacturing process of high quality lenses. Although they have an excellent reproducibility and sensitivity, the set-up is expensive and the accuracy of the measurement needs to be checked frequently. This paper discusses an alternative lens metrology method that is based on an...
conference paper 2006
document
Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author)
journal article 2006
document
Braat, J.J.M. (author), Dirksen, P. (author), Janssen, A.J.E.M. (author), Van Haver, S. (author), Van de Nes, A.S. (author)
The judgment of the imaging quality of an optical system can be carried out by examining its through-focus intensity distribution. It has been shown in a previous paper that a scalar-wave analysis of the imaging process according to the extended Nijboer–Zernike theory allows the retrieval of the complex pupil function of the imaging system,...
journal article 2005
document
Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwesteijn, A. (author)
conference paper 2005
document
Braat, J.J.M. (author), Dirksen, P. (author), Janssen, A.J.E.M. (author), Van de Nes, A.S. (author)
Poster presentation with Philips Research Laboratories
journal article 2004
document
Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Kwinten, H. (author), Van Steenwinckel, D. (author)
This study presents an experimental method to determine the resist parameters that are at the origin of a general blurring of the projected aerial image. The resist model includes the effects of diffusion in the horizontal plane and a second cause for image blur that originates from a stochastic variation of the focus parameter. The used...
conference paper 2004
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