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Alkemade, P.F.A. (author), Miro, H. (author), Van Veldhoven, E. (author), Maas, D.J. (author), Smith, D.A. (author), Rack, P.D. (author)
The sub-nanometer beam of a helium ion microscope was used to study and optimize helium-ion beam induced deposition of PtC nanopillars with the (CH3)3Pt(CPCH3) precursor. The beam current, beam dwell time, precursor refresh time, and beam focus have been independently varied. Continuous beam exposure resulted in narrow but short pillars, while...
journal article 2011
Alkemade, P.F.A. (author), Chen, P. (author), Van Veldhoven, E. (author), Maas, D. (author)
An analytical model for the growth of nanopillars by helium ion-beam-induced deposition is presented and compared to experimental data. This model describes the competition between pillar growth in vertical and lateral directions. It assumes that vertical growth is induced by incident primary ions and type-1 secondary electrons, whereas lateral...
journal article 2010
Castaldo, V. (author), Hagen, C.W. (author), Kruit, P. (author), Van Veldhoven, E. (author), Maas, D. (author)
The determination of the quality of an imaging system is not an easy task for, in general, at least three parameters, strictly interdependent, concur in defining it: resolution, contrast, and signal-to-noise ratio. The definition of resolution itself in scanning microscopy is elusive and the case of scanning ion microscopy is complicated by the...
journal article 2009