Searched for: +
(1 - 2 of 2)
document
De Rooij-Lohmann, V.I.T.A. (author), Veldhuizen, L.W. (author), Zoethout, E. (author), Yakshin, A.E. (author), Van de Kruijs, R.W.E. (author), Thijsse, B.J. (author), Gorgoi, M. (author), Schäfers, F. (author), Bijkerk, F. (author)
To enhance the thermal stability, B4C diffusion barrier layers are often added to Mo/Si multilayer structures for extreme ultraviolet optics. Knowledge about the chemical interaction between B4C and Mo or Si, however is largely lacking. Therefore, the chemical processes during annealing up to 600?°C of a Mo/B4C/Si layered structure have been...
journal article 2010
document
Kessels, M.J.H. (author), Bijkerk, F. (author), Tichelaar, F.D. (author), Verhoeven, J. (author)
We developed and demonstrate an analysis method in which we calibrate the intensity scale of cross-sectional transmission electron microscopy (TEM) using Cu K? reflectometry. This results in quantitative in-depth density profiles of multilayer structures. Only three free parameters are needed to obtain the calibrated profiles, corresponding to...
journal article 2005