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Lateral gas phase diffusion length of boron atoms over Si/B surfaces during CVD of pure boron layersMohammadi, V. (author), Nihtianov, S. (author)The lateral gas phase diffusion length of boron atoms, LB, along silicon and boron surfaces during chemical vapor deposition(CVD) using diborane (B2H6) is reported. The value of LB is critical for reliable and uniform boron layer coverage. The presented information was obtained experimentally and confirmed analytically in the...journal article 2016
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Mok, K.R.C. (author), Naber, R.C.G. (author), Nanver, L.K. (author)Emitter saturation current densities, Joe have been investigated with different boron implantation dose and annealing conditions. The higher thermal budgets used here are shown experimentally to improve Joe, implying more complete defect dissolution. Simulations show that significant degradation in Joe can be attributed to the presence of...conference paper 2012