Van der Heijden, R. (author), Andriesse, M.S.P. (author), Carlström, C.F. (author), Van der Drift, E. (author), Geluk, E.J. (author), Van der Heijden, R.W. (author), Karouta, F. (author), Nouwens, P. (author), Siang Oei, Y. (author), De Vries, T. (author) Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etching twodimensional photonic crystals in InP-based materials. Etch rates up to 3.7 µm/min and selectivity’s to the SiN mask up to 19 are reported. For the removal of indiumchloride etch products both the application of elevated temperatures and...
conference paper 2004
