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Shao, Y. (author), Loktev, Mikhail (author), Tang, Y. (author), Bociort, F. (author), Urbach, Paul (author)
For advanced imaging systems, e.g., projection systems for optical lithography, spatially varying aberration calibration is of utmost importance to achieve uniform imaging performance over the entire field-of-view (FOV). Here we present an efficient, accurate, and robust spatially varying aberration calibration method using a pair of 2...
journal article 2019