Engineering of the spin on dopant process on silicon on insulator substrate

We report on a systematic analysis of phosphorus diffusion in silicon on insulator thin film via spin-on-dopant process (SOD). This method is used to provide an impurity source for semiconductor junction fabrication. The dopant is first spread into the substrate via SOD and then diffused by a rapid thermal annealing process. The dopant...

The chemical throwing power of lithium-based inhibitors from organic coatings on AA2024-T3

Chemical throwing power, being the distance over which an inhibitor is able to protect a defect effectively, is an important parameter for active protective coatings. This study investigates the chemical throwing power of lithium-based leachable corrosion inhibitors exhibiting different leaching kinetics, from coatings at different inhibitor...

Compositional study of a corrosion protective layer formed by leachable lithium salts in a coating defect on AA2024-T3 aluminium alloys

Organic primer coatings loaded with environmentally harmful Cr(VI) corrosion inhibitive pigments still play an important role in corrosion protection of aluminium alloys for the aerospace industry. A potential “green” alternative coating system has recently been developed, loaded with lithium salt corrosion inhibitors. Under exposure to...