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Ansuinelli, P. (author)
The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on...
doctoral thesis 2022
document
Dwivedi, P. (author), Konijnenberg, A.P. (author), Pereira, S.F. (author), Meisner, J.A. (author), Urbach, Paul (author)
Ptychography is a form of coherent diffractive imaging; it employs far-field intensity patterns of the object to reconstruct the object. In ptychography, an important limiting factor for the reconstructed image quality is the uncertainty in the probe positions. Here, we propose a new approach which uses the hybrid input-output algorithm and...
journal article 2019
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Ansuinelli, P. (author), Coene, W.M.J.M. (author), Urbach, Paul (author)
EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to...
conference paper 2019
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Gong, H. (author), Pozzi, P. (author), Soloviev, O.A. (author), Verhaegen, M.H.G. (author), Vdovin, Gleb (author)
We present a reference-less and time-multiplexing phase retrieval method by making use of the digital micromirror device (DMD). In this method, the DMD functions not only as a flexible binary mask which modulates the optical field, but also as a sampling mask for measuring corresponding phases, which makes the whole setup simple and robust. The...
conference paper 2016
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Kumar, N. (author)
The electronics which makes our lives easier like mobiles, computers, digital cameras contain chips with very small semiconductor components like transistors. When transistors can be made even smaller, the chip can accommodate a larger number of components, which gives more processing capacity, resulting in a faster device with an increased...
doctoral thesis 2014
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Polo, A. (author)
In the semiconductor industry, optical lithography is presently the most widespread technology used to print a geometrical pattern on a semiconductor wafer. Because of the plans imposed by the International Technology Roadmap for Semiconductors (ITRS) for more powerful and smaller chips, new printing technologies capable of printing smaller...
doctoral thesis 2014
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Polo, A. (author), Kutchoukov, V. (author), Bociort, F. (author), Pereira, S.F. (author), Urbach, H.P. (author)
We apply a phase retrieval algorithm to the intensity pattern of a Hartmann wavefront sensor to measure with enhanced accuracy the phase structure of a Hartmann hole array. It is shown that the rms wavefront error achieved by phase reconstruction is one order of magnitude smaller than the one obtained from a typical centroid algorithm....
journal article 2012
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Braat, J.J.M. (author), Dirksen, P. (author), Janssen, A.J.E.M. (author), Van Haver, S. (author), Van de Nes, A.S. (author)
The judgment of the imaging quality of an optical system can be carried out by examining its through-focus intensity distribution. It has been shown in a previous paper that a scalar-wave analysis of the imaging process according to the extended Nijboer–Zernike theory allows the retrieval of the complex pupil function of the imaging system,...
journal article 2005
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