Estimating resist parameters in optical lithography using the extended Nijboer-Zernike theory

High-density optical data storage

Optimizing Fourier filtering for digital holographic particle image velocimetry

Extended Nijboer–Zernike approach to aberration and birefringence retrieval in a high-numerical-aperture optical system

Finding new local minima by switching merit functions in optical system optimization

Correcting movement errors in frequency-sweeping interferometry

Comparison of blind imaging performance of Fizeau and Michelson type arrays for a partially resolved object

A deformable mirror based on electrocapillary actuation of a liquid surface

Absolute distance metrology for space interferometers

Measurements from a novel interferometer for EUVL mirror substrates

Aberration retrieval for high-NA optical systems using the Extended Nijboer-Zernike theory

Correction of the phase retardation caused by intrinsic birefringence in deep UV lithography

Reusable holographic velocimetry system based on polarization multiplexing in Bacteriorhodopsin

Influence of virtual images on the signal-to-noise ratio in digital in-line particle holography

Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design

Networks of local minima for EUV mirror systems

Generation of optical systems for lithography via saddle points

Michelson wide-field stellar interferometry: Principles and experimental verification

Optimization of multilayer reflectors for extreme ultraviolet lithography

Demonstration of nulling using delay line phase shifters