Searched for: author%3A%22Alkemade%2C+P.F.A.%22
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Lahabi, K. (author), Amundsen, Morten (author), Ouassou, Jabir Ali (author), Beukers, Ewout (author), Pleijster, Menno (author), Linder, Jacob (author), Alkemade, P.F.A. (author), Aarts, Jan (author)
Spin-triplet Cooper pairs induced in ferromagnets form the centrepiece of the emerging field of superconducting spintronics. Usually the focus is on the spin-polarization of the triplets, potentially enabling low-dissipation magnetization switching. However, the magnetic texture which provides the fundamental mechanism for generating triplets...
journal article 2017
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Nanda, G. (author), Hlawacek, Gregor (author), Goswami, S. (author), Watanabe, Kenji (author), Taniguchi, Takashi (author), Alkemade, P.F.A. (author)
We report the etching of and electronic transport in nanoribbons of graphene sandwiched between atomically flat hexagonal boron nitride (h-BN). The etching of ribbons of varying width was achieved with a focused beam of 30 keV He<sup>+</sup> ions. Using in-situ electrical measurements, we established a critical dose of 7000 ions nm<sup>−2<...
journal article 2017
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van der Walle, P (author), Kramer, E. (author), van der Donck, J.C.J. (author), Mulckhuyse, W (author), Nijsten, L. (author), Bernal Arango, F.A. (author), de Jong, A. (author), van Zeijl, E. (author), Spruit, H. E.T. (author), van den Berg, J.H. (author), Nanda, G. (author), van Langen-Suurling, A.K. (author), Alkemade, P.F.A. (author), Pereira, S.F. (author), Maas, D.J. (author)
Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and...
conference paper 2017
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Nanda, G. (author), Veldhoven, E. van (author), Maas, D. (author), Herfst, R. (author), Sadeghian Marnani, H. (author), Alkemade, P.F.A. (author)
abstract 2016
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Bouwens, MAJ (author), Maas, D (author), van der Donck, JCJ (author), Alkemade, P.F.A. (author), van der Walle, P (author)
To qualify tools of semiconductor manufacturing, particles unintentionally deposited in these tools are character-ized using blank wafers. With fast optical inspection tools one can quickly localize these particle defects. An ex-ample is TNO's Rapid Nano, which operates in optical darkfield. The next step is defect review for further...
journal article 2016
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Nanda, G. (author), Van Veldhoven, E. (author), Maas, D. (author), Sadeghian, H. (author), Alkemade, P.F.A. (author)
The authors report the direct-write growth of hammerhead atomic force microscope(AFM) probes by He+beam induced deposition of platinum-carbon. In order to grow a thin nanoneedle on top of a conventional AFM probe, the authors move a focused He+beam during exposure to a PtC precursor gas. In the final growth stage, a perpendicular movement of the...
journal article 2015
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Overweg, H.C. (author), Den Haan, A.M.J. (author), Eerkens, H.J. (author), Alkemade, P.F.A. (author), La Rooij, A.L. (author), Spreeuw, R.J.C. (author), Bossoni, L. (author), Oosterkamp, T.H. (author)
We investigate the degradation of the magnetic moment of a 300?nm thick FePt film induced by Focused Ion Beam (FIB) milling. A 1??m?×?8??m rod is milled out of a film by a FIB process and is attached to a cantilever by electron beam induced deposition. Its magnetic moment is determined by frequency-shift cantilever magnetometry. We find that the...
journal article 2015
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Chimento, P.F. (author), Alkemade, P.F.A. (author), 'T Hooft, G.W. (author), Eliel, E.R. (author)
We respond to a Comment on our Letter [Opt. Lett. 37, 4946 (2012)], in which we reported on the spin-to-orbital optical angular momentum conversion of a circular nanoslit in a thin metal layer. We claimed, in an unfortunately worded sentence, that the conversion efficiency was independent of the slit’s dichroism, which the Comment pointed out...
journal article 2013
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Chimento, P.F. (author), Alkemade, P.F.A. (author), 'T Hooft, G.W. (author), Eliel, E.R. (author)
We demonstrate partial conversion of circularly polarized light into orbital angular momentum-carrying vortex light with opposite-handed circular polarization. This conversion is accomplished in a novel manner using the birefringent properties of a circular subwavelength slit in a thin metal film. Our technique can be applied over a very wide...
journal article 2012
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Chimento, P.F. (author), Kuzmin, N.V. (author), Bosman, J. (author), Alkemade, P.F.A. (author), 'T Hooft, G.W. (author), Eliel, E.R. (author)
We have experimentally studied the polarization-dependent transmission properties of a nanoslit in a gold film as a function of its width. The slit exhibits strong birefringence and dichroism. We find, surprisingly, that the transmission of the polarization parallel to the slit only disappears when the slit is much narrower than half a...
journal article 2011
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Alkemade, P.F.A. (author), Miro, H. (author), Van Veldhoven, E. (author), Maas, D.J. (author), Smith, D.A. (author), Rack, P.D. (author)
The sub-nanometer beam of a helium ion microscope was used to study and optimize helium-ion beam induced deposition of PtC nanopillars with the (CH3)3Pt(CPCH3) precursor. The beam current, beam dwell time, precursor refresh time, and beam focus have been independently varied. Continuous beam exposure resulted in narrow but short pillars, while...
journal article 2011
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Alkemade, P.F.A. (author), Chen, P. (author), Van Veldhoven, E. (author), Maas, D. (author)
An analytical model for the growth of nanopillars by helium ion-beam-induced deposition is presented and compared to experimental data. This model describes the competition between pillar growth in vertical and lateral directions. It assumes that vertical growth is induced by incident primary ions and type-1 secondary electrons, whereas lateral...
journal article 2010
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Chen, P. (author), Van Veldhoven, E. (author), Sanford, C.A. (author), Salemink, H.W.M. (author), Maas, D.J. (author), Smith, D.A. (author), Rack, P.D. (author), Alkemade, P.F.A. (author)
A 25 keV focused helium ion beam has been used to grow PtC nanopillars on a silicon substrate by beam-induced decomposition of a (CH3)3Pt(CPCH3) precursor gas. The ion beam diameter was about 1 nm. The observed relatively high growth rates suggest that electronic excitation is the dominant mechanism in helium ion-beam-induced deposition. Pillars...
journal article 2010
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Chen, P. (author), Salemink, H.W.M. (author), Alkemade, P.F.A. (author)
The authors report the results of investigating two models for ion-beam-induced deposition (IBID). These models describe IBID in terms of the impact of secondary electrons and of sputtered atoms, respectively. The yields of deposition, sputtering, and secondary electron emission, as well as the energy spectra of the secondary electrons were...
journal article 2009
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Sanford, C.A. (author), Stern, L. (author), Barriss, L. (author), Farkas, L. (author), DiManna, M. (author), Mello, R. (author), Maas, D.J. (author), Alkemade, P.F.A. (author)
Helium ion microscopy is now a demonstrated practical technology that possesses the resolution and beam currents necessary to perform nanofabrication tasks, such as circuit edit applications. Due to helium’s electrical properties and sample interaction characteristics relative to gallium, it is likely that the properties and deposition...
journal article 2009
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Sidorkin, V.A. (author), Alkemade, P.F.A. (author), Salemink, H.W.M. (author), Schmits, R. (author), Van der Drift, E. (author)
A method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist is provided for enhanced pattern-transfer capabilities. The essence of the proposed method is to form a protective “cap” on top of the resist structure by means of electron-beam-induced deposition (EBID) in a self-aligned approach. This is...
journal article 2009
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Sidorkin, V. (author), Van Veldhoven, E. (author), Van der Drift, E.W.J.M. (author), Alkemade, P.F.A. (author), Salemink, H. (author), Maas, D. (author)
Scanning helium ion beam lithography is presented as a promising pattern definition technique for dense sub-10-nm structures. The powerful performance in terms of high resolution, high sensitivity, and a low proximity effect is demonstrated in a hydrogen silsesquioxane resist.
journal article 2009
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Chen, P. (author), Salemink, H.W.M. (author), Alkemade, P.F.A. (author)
Ion-beam-induced deposition (IBID) is a powerful technique for prototyping three-dimensional nanostructures. To study its capability for this purpose, the authors investigate the proximity effect in IBID of nanopillars. In particular, the changes in shape and dimension of pillars are studied when a second pillar is grown near an existing pillar....
journal article 2009
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Chen, P. (author), Wu, M.Y. (author), Salemink, H.W.M. (author), Alkemade, P.F.A. (author)
We report a new method for the fabrication of sub-10 nm nanopores in a fast single process step. The pore formation is accomplished by exploiting the competition between sputtering and deposition in ion-beam-induced deposition (IBID) on a thin membrane. The pore diameter can be controlled by adjusting the ion beam and gas exposure conditions....
journal article 2008
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Guyader, L.Le. (author), Kirilyuk, A. (author), Rasing, Th. (author), Wurtz, G.A. (author), Zayats, A.V. (author), Alkemade, P.F.A. (author), Smolyaninov, I.I. (author)
journal article 2008
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