Searched for: author%3A%22Maas%2C+D.J.%22
(1 - 5 of 5)
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Krielaart, M.A.R. (author), Maas, D.J. (author), Loginov, S. (author), Kruit, P. (author)
We designed and built a compact bi-axial electron beam separator. This separator is an indispensable electron optical element in the development of MEMS-mirror-based miniaturized concepts for quantum electron microscopy (QEM) and aberration-corrected low-voltage scanning electron microscopy (AC-SEM). The separator provides the essential...
journal article 2020
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van der Walle, P (author), Kramer, E. (author), van der Donck, J.C.J. (author), Mulckhuyse, W (author), Nijsten, L. (author), Bernal Arango, F.A. (author), de Jong, A. (author), van Zeijl, E. (author), Spruit, H. E.T. (author), van den Berg, J.H. (author), Nanda, G. (author), van Langen-Suurling, A.K. (author), Alkemade, P.F.A. (author), Pereira, S.F. (author), Maas, D.J. (author)
Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and...
conference paper 2017
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Alkemade, P.F.A. (author), Miro, H. (author), Van Veldhoven, E. (author), Maas, D.J. (author), Smith, D.A. (author), Rack, P.D. (author)
The sub-nanometer beam of a helium ion microscope was used to study and optimize helium-ion beam induced deposition of PtC nanopillars with the (CH3)3Pt(CPCH3) precursor. The beam current, beam dwell time, precursor refresh time, and beam focus have been independently varied. Continuous beam exposure resulted in narrow but short pillars, while...
journal article 2011
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Chen, P. (author), Van Veldhoven, E. (author), Sanford, C.A. (author), Salemink, H.W.M. (author), Maas, D.J. (author), Smith, D.A. (author), Rack, P.D. (author), Alkemade, P.F.A. (author)
A 25 keV focused helium ion beam has been used to grow PtC nanopillars on a silicon substrate by beam-induced decomposition of a (CH3)3Pt(CPCH3) precursor gas. The ion beam diameter was about 1 nm. The observed relatively high growth rates suggest that electronic excitation is the dominant mechanism in helium ion-beam-induced deposition. Pillars...
journal article 2010
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Sanford, C.A. (author), Stern, L. (author), Barriss, L. (author), Farkas, L. (author), DiManna, M. (author), Mello, R. (author), Maas, D.J. (author), Alkemade, P.F.A. (author)
Helium ion microscopy is now a demonstrated practical technology that possesses the resolution and beam currents necessary to perform nanofabrication tasks, such as circuit edit applications. Due to helium’s electrical properties and sample interaction characteristics relative to gallium, it is likely that the properties and deposition...
journal article 2009
Searched for: author%3A%22Maas%2C+D.J.%22
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