Adaptive Optics for EUV Lithography: Phase Retrieval for Wavefront Metrology

In the semiconductor industry, optical lithography is presently the most widespread technology used to print a geometrical pattern on a semiconductor wafer. Because of the plans imposed by the International Technology Roadmap for Semiconductors (ITRS) for more powerful and smaller chips, new printing technologies capable of printing smaller...

Predictive control of thermally induced wavefront aberrations

In this paper we experimentally demonstrate the proof of concept for predictive control of thermally induced wavefront aberrations in optical systems. On the basis of the model of thermally induced wavefront aberrations and using only past wavefront measurements, the proposed adaptive optics controller is able to predict and to compensate the...

Identification of a dynamical model of a thermally actuated deformable mirror

Using the subspace identification technique, we identify a finite dimensional, dynamical model of a recently developed prototype of a thermally actuated deformable mirror (TADM). The main advantage of the identified model over the models described by partial differential equations is its low complexity and low dimensionality. Consequently, the...

Experimental demonstration of phase retrieval from a single defocused intensity measurement in the approximation of small aberrations

We analytically demonstrate that Phase Retrieval (PR) from defocused intensity measurements is achievable using a single measurement plane. Following this approach, the predicted plane is found at a defocus distance of 4? optical unit. Experimental results confirm the theoretical predictions

Iterative learning control of a membrane deformable mirror for optimal wavefront correction

We present an iterative learning control (ILC) algorithm for controlling the shape of a membrane deformable mirror (DM). We furthermore give a physical interpretation of the design parameters of the ILC algorithm. On the basis of this insight, we derive a simple tuning procedure for the ILC algorithm that, in practice, guarantees stable and fast...

Theoretical analysis for best defocus measurement plane for robust phase retrieval

We study the phase retrieval (PR) technique using through-focus intensity measurements and explain the dependence of PR on the defocus distance. An optimal measurement plane in the out-of-focus region is identified where the intensity distribution on the optical axis drops to the first minimum after focus. Experimental results confirm the...

An innovative and efficient method to control the shape of push-pull membrane deformable mirror

We carry out performance characterisation of a commercial push and pull deformable mirror with 48 actuators (Adaptica Srl). We present a detailed description of the system as well as a statistical approach on the identification of the mirror influence function. A new efficient control algorithm to induce the desired wavefront shape is also...

Experimental techniques for aberration retrieval with through-focus intensity images

Measurement techniques to determine the aberration of an optical system, by obtaining through-focus intensity images that are produced when the object is a point source at infinity, are shown. The analysis of the aberrations is made using the extended version of the Nijboer-Zernike diffraction theory. This theory provides a semi analytical...

Terahertz wavefronts measured using the Hartmann sensor principle

We demonstrate for the first time that the Hartmann wavefront sensor (HWS) principle can be applied for characterizing the wavefronts of terahertz (THz) electromagnetic radiation. The THz Hartmann wavefront sensor consists of a metallic plate with an array of holes and a twodimensional scanable pyro-electric detector. The THz radiation with...

Determination of wavefront structure for a HartmannWavefront Sensor using a phase-retrieval method

We apply a phase retrieval algorithm to the intensity pattern of a Hartmann wavefront sensor to measure with enhanced accuracy the phase structure of a Hartmann hole array. It is shown that the rms wavefront error achieved by phase reconstruction is one order of magnitude smaller than the one obtained from a typical centroid algorithm....

Wavefront measurement for EUV lithography system through Hartmann sensor

Accurate wavefront aberration measurement are essential for next-generation Extreme Ultraviolet (EUV) Lithography. During the past years several accurate interferometric techniques have been developed, but these techniques have limitation. In this work we discuss a different technique based on the Hartmann Wavefront Sensor that requires no...