Synthesis of highly-uniform titania overcoats on a mesoporous alumina catalyst support by atomic layer deposition and their application in hydroprocessing

The feasibility of gas phase deposition using a Ti alkoxide precursor for precise surface modification of catalysts was demonstrated by modifying a mesoporous alumina support with a Ti oxide overcoat. Titanium tetra-isopropoxide yields a Ti oxide layer that covers homogeneously the alumina surface. Uniformity of the deposited TiO₂...

Suppressing the Photocatalytic Activity of TiO2 Nanoparticles by Extremely Thin Al2O3 Films Grown by Gas-Phase Deposition at Ambient Conditions

This work investigated the suppression of photocatalytic activity of titanium dioxide (TiO2) pigment powders by extremely thin aluminum oxide (Al2O3) films deposited via an atomic-layer-deposition-type process using trimethylaluminum (TMA) and H2O as precursors. The deposition was performed on multiple grams of TiO2 powder at room temperature...

Deposition Mechanism of Aluminum Oxide on Quantum Dot Films at Atmospheric Pressure and Room Temperature

Stability of quantum dot (QD) films is an issue of concern for applications in devices such as solar cells, LEDs, and transistors. This paper analyzes and optimizes the passivation of such QD films using gas-phase deposition, resulting in enhanced stability. Crucially, we deposited alumina at economically attractive conditions, room...

Enhancing the activation of silicon carbide tracer particles for PEPT applications using gas-phase deposition of alumina at room temperature and atmospheric pressure

Performance improvement by alumina coatings on Y₃Al₅O₁₂: Ce³⁺ phosphor powder deposited using atomic layer deposition in a fluidized bed reactor

To improve the thermal stability, Al₂O₃ has been successfully coated on a Y₃Al₅O₁₂:Ce³⁺ (YAG:Ce) phosphor powder host by using the Atomic Layer Deposition (ALD) approach in a fluidized bed reactor. Transmission Electron Microscopy (TEM) and Energy Dispersive X-ray spectroscopy ...

Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions

We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows coating heat-sensitive materials, while working at atmospheric pressure would simplify the scale-up of this process. We performed 4, 7 and 15...