Zagwijn, P.M. (author), Verweij, W. (author), Pierreux, D. (author), Noureddine, A. (author), Bankras, R. (author), Oosterlaken, E. (author), Snijders, G.J. (author), Van den Hout, M. (author), Fischer, P. (author), Wilhelm, R. (author), Knapp, M. (author) This article describes a novel CVD process for TiN films developed in a 300 mm Vertical Furnace. We have solved Chlorine incorporation at low temperature inside the TiN layer while at the same time the batch process yields a 3 times higher throughput per dual reactor system compared to a single wafer system with 3 chambers.We show process...
journal article 2009
