Device operation of P-ion-implanted n-BaSi₂/p-Si heterojunction solar cells

We formed phosphorous(P)-ion-implanted n-BaSi₂ films on p-Si(111) substrates and demonstrated solar-cell functionality of the n-BaSi₂/p-Si heterojunction under AM1.5 illumination. The BaSi₂ films were grown by molecular beam epitaxy, followed by implantation of P ions to the BaSi₂ films using PF<sub...

Implantation-based passivating contacts for crystalline silicon front/rear contacted solar cells

In this work, we develop SiO_x/poly-Si carrier-selective contacts grown by low-pressure chemical vapor deposition and boron or phosphorus doped by ion implantation. We investigate their passivation properties on symmetric structures while varying the thickness of poly-Si in a wide range (20-250 nm). Dose and energy of implantation...

Strategies for the implementation of ion implantation doping technique in c-Si wafer-based solar cells

Electricity consumption is increased in last twenty years. It is crucial therefore to find alternative, renewable and sustainable sources to mantain this development. Solar energy has proved to be a valid alternative to produce clean energy. The gigantic development of solar energy technology in the last twenty years has lead to a scenario...

Insights to emitter saturation current densities of boron implanted samples based on defects simulations

Emitter saturation current densities, Joe have been investigated with different boron implantation dose and annealing conditions. The higher thermal budgets used here are shown experimentally to improve Joe, implying more complete defect dissolution. Simulations show that significant degradation in Joe can be attributed to the presence of...

Nanosystems in Ceramic Oxides Created by Means of Ion Implantation

The material properties of nanometer-sized clusters are dependent on the cluster size. Changing the cluster dimensions induces structural phase transformations, metal-insulator transitions, non-linear optical properties and widening of the band gap of semiconductors. In this work, nanoclusters are created by ion implantation followed by thermal...

On the effects of implantation temperature in helium implanted silicon

He+ ions were implanted into silicon with a fluence of 5×10 16?cm?2 at different temperatures ranging from 473 to 1073 K. Samples were analyzed by thermal helium desorption spectroscopy and by transmission electron microscopy. As far as cavity formation is concerned, the behavior can be divided into three stages depending on the implantation...

The Transverse Junction Solar Cell