Searched for: collection%3Air
(1 - 3 of 3)
document
Krieg, M.L. (author), Braat, J.J.M. (author)
A previously reported interferometer without intermediate optics is used to perform measurements on an aspherical extreme ultraviolet lithography mirror substrate. Acousto-optic modulation based phase shifting is used together with a novel phase retrieval algorithm to retrieve the phase distribution from our interferograms. The phase...
conference paper 2005
document
Krieg, M.L. (author)
For the past thirty years, microchips have doubled in complexity every two years. This increasing complexity required that the size of the structures written on silicon halve at the same rate. A fundamentally limiting factor to the size of microchip structures is the wavelength of the lithographic projection processes used in their manufacture....
doctoral thesis 2004
document
Krieg, M.L. (author), Braat, J.J.M. (author)
This paper will illustrate several approaches to retrieving the shape of aspherical reflective surfaces as used in EUV Lithography, from measurements from a previously reported angstrom-accuracy interferometer. First, the working principles of the interferometer will be reviewed, and typical measurement data expected from the instrument will be...
conference paper 2004