Searched for: collection%3Air
(1 - 2 of 2)
Meskers, A.J.H. (author)
Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate position measurement systems, which is currently led by the advent of Extreme UltraViolet (EUV)-lithography machines. This PhD-research describes an interferometric displacement measurement system that possess the potential to foresee in the need for...
doctoral thesis 2014
Soloviev, O. (author), Vdovin, G. (author)
This article presents a prototype of a CMOS phase sensor for high accuracy (1 Angstrom) heterodyne interferometry. Switched integrators realization of a lock-in pixel for 4-bucket phase detection algorithm is described and illustrated by experimental results. Factors that limit the accuracy of this implementation and possible ways for its...
conference paper 2005