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Limodio, G. (author), D'Herouville, G. (author), Mazzarella, L. (author), Zhao, Y. (author), Yang, G. (author), Isabella, O. (author), Zeman, M. (author)
This work shows an alternative surface cleaning method for c-Si wafers to replace the standard chemical procedures as RCA or HNO <sub>3</sub> which involve hazardous chemicals or unstable processes. The method consists in a high-temperature oxidation treatment (HTO) performed in a classical tube furnace that incorporates organic and metal...
journal article 2019