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Van Bruggen, M.J. (author)
The development of a multi-electron beam system is described which is dedicated for electron beam induced deposition (EBID) with sub-10 nm resolution. EBID is a promising mask-less nanolithography technique which has the potential to become a viable technique for the fabrication of 20-2 nm structures after 2013, as described by the International...
doctoral thesis 2008
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Fransen, M.J. (author)
doctoral thesis 1999
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Buist, A.H. (author)
doctoral thesis 1995
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Dubbeldam, L. (author)
doctoral thesis 1989
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Silvis-Cividjian, N. (author)
doctoral thesis 2002
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Grigorescu, A.E. (author)
The continuous shrinking of the feature size forces scientists and engineers to develop new lithographic techniques and suitable materials which can meet the requirements of the market. Despite its low throughput, EBL remains the number one candidate when writing very small structures. Achieving ultimate resolution with EBL requires not only a...
doctoral thesis 2009
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Sidorkin, V.A. (author)
The research work described in this thesis deals with studying the ultimate resolution capabilities of electron and ion beam lithography (EBL and IBL respectively) with a focus on resist and exposure processes. The aim of this research was to enlarge knowledge and improve methods on the formation of ultra-high resolution structures. Research sub...
doctoral thesis 2010
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Narváez, A.C. (author)
Cathodoluminescence (CL), the excitation of light by an electron beam, has gained attention as an analysis tool for investigating the optical response of a structure, at a resolution that approaches that in electron microscopy, in the nanometer range. However, the application possibilities are limited because the use of transparent substrates,...
doctoral thesis 2014
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Cook, B.J. (author)
doctoral thesis 2013
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Van der Stam, M.A.J. (author)
doctoral thesis 1996
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Castaldo, V. (author)
The structure of the thesis is the following. The first chapter is an introduction to scanning microscopy, where the path that led to the Focused Ion Beam (FIB) is described and the main differences between electrons and ion beams are highlighted. Chapter 2 is what is normally referred to (which I do not really like) as ‘the theory chapter’. The...
doctoral thesis 2011
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de Ruijter, W.J. (author)
doctoral thesis 1992
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Jørgensen, L.V. (author)
doctoral thesis 1998
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Zhang, Y. (author)
doctoral thesis 2008
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Vijgen, L.J. (author)
doctoral thesis 1994
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Faber, J.S. (author)
doctoral thesis 1996
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Botman, A.P.J.M. (author)
Electron beam induced deposition (EBID) is a novel nanofabrication technique allowing the rapid prototyping of three-dimensional nanodevices and the metallic wiring of nanostructures, and is a promising technique for many applications in nanoresearch. EBID is a process wherein a precursor molecule containing the material to be deposited is...
doctoral thesis 2009
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Mook, H.W. (author)
doctoral thesis 2000
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Van Aken, R.H. (author)
This thesis has discussed two electron microscopy applications that make use of ultra-thin foils: the tunnel junction emitter and the low-energy foil corrector. Both applications have in common that the electron beam is sent through the thin foil at low energy. Part of the electrons will scatter in the foil, thus causing a reduction of the...
doctoral thesis 2005
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Jun, D.S. (author)
doctoral thesis 2014
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