Searched for: contributor:"Kruit, P. (promotor)"
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Sidorkin, V.A. (author)
The research work described in this thesis deals with studying the ultimate resolution capabilities of electron and ion beam lithography (EBL and IBL respectively) with a focus on resist and exposure processes. The aim of this research was to enlarge knowledge and improve methods on the formation of ultra-high resolution structures. Research sub...
doctoral thesis 2010