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Sidorkin, V.A. (author)
The research work described in this thesis deals with studying the ultimate resolution capabilities of electron and ion beam lithography (EBL and IBL respectively) with a focus on resist and exposure processes. The aim of this research was to enlarge knowledge and improve methods on the formation of ultra-high resolution structures. Research sub...
doctoral thesis 2010
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Dokania, A.K. (author)
In this thesis an attempt is made to make a step forward in the development of next a generation scanning electron lithography machine for sub 25nm chip making. One of the challenges for such a system is to have sufficient beam-lets with enough current for parallel writing which requires a sufficiently bright electron source. Since the present...
doctoral thesis 2010
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Botman, A.P.J.M. (author)
Electron beam induced deposition (EBID) is a novel nanofabrication technique allowing the rapid prototyping of three-dimensional nanodevices and the metallic wiring of nanostructures, and is a promising technique for many applications in nanoresearch. EBID is a process wherein a precursor molecule containing the material to be deposited is...
doctoral thesis 2009
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Bronsgeest, M.S. (author)
doctoral thesis 2009
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Grigorescu, A.E. (author)
The continuous shrinking of the feature size forces scientists and engineers to develop new lithographic techniques and suitable materials which can meet the requirements of the market. Despite its low throughput, EBL remains the number one candidate when writing very small structures. Achieving ultimate resolution with EBL requires not only a...
doctoral thesis 2009
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Zhang, Y. (author)
doctoral thesis 2008
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Van Dorp, W.F. (author)
Work started with a critical review of literature from the past 70-odd years. The review shows that the physical processes occurring in EBID are generally well understood. By combining models for electron scattering in a solid and electron beam induced heating and knowledge of growth regimes, the majority of the experimental results was...
doctoral thesis 2008
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Van Bruggen, M.J. (author)
The development of a multi-electron beam system is described which is dedicated for electron beam induced deposition (EBID) with sub-10 nm resolution. EBID is a promising mask-less nanolithography technique which has the potential to become a viable technique for the fabrication of 20-2 nm structures after 2013, as described by the International...
doctoral thesis 2008
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Tondare, V.N. (author)
Abstract not available
doctoral thesis 2006
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Van Aken, R.H. (author)
This thesis has discussed two electron microscopy applications that make use of ultra-thin foils: the tunnel junction emitter and the low-energy foil corrector. Both applications have in common that the electron beam is sent through the thin foil at low energy. Part of the electrons will scatter in the foil, thus causing a reduction of the...
doctoral thesis 2005
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Nijkerk, M.D. (author)
doctoral thesis 2002
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Silvis-Cividjian, N. (author)
doctoral thesis 2002
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Mook, H.W. (author)
doctoral thesis 2000
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Mertens, B.M. (author)
doctoral thesis 1999
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Fransen, M.J. (author)
doctoral thesis 1999
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Jørgensen, L.V. (author)
doctoral thesis 1998
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de Jager, P.W.H. (author)
doctoral thesis 1997
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Gubbens, A.J. (author)
doctoral thesis 1997
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Faber, J.S. (author)
doctoral thesis 1996
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Jiang, X.R. (author)
doctoral thesis 1996
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