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Storm, A.J. (author), Chen, J.H. (author), Ling, X.S. (author), Zandbergen, H.W. (author), Dekker, C. (author)
The imaging beam of a transmission electron microscope can be used to fine tune critical dimensions in silicon oxide nanostructures. This technique is particularly useful for the fabrication of nanopores with single-nanometer precision, down to 2 nm. We report a detailed study on the effect of electron-beam irradiation on apertures with various...
journal article 2005