Searched for: faculty:"Applied%5C%2BSciences"
(1 - 14 of 14)
document
Ushakova, K. (author), Van den Berg, Q.Y. (author), Pereira, S.F. (author), Urbach, H.P. (author)
Spot size reduction is demonstrated by printing focused spots from amplitude-modulated radially polarized light at the wavelength ? = 405 nm on a photoresist. Amplitude modulation is realized by ring illumination and by application of an optimized amplitude distribution function. Amplitude modulation is implemented via spatial light modulator,...
journal article 2015
document
Hari, S. (author), Hagen, C.W. (author), Verduin, T. (author), Kruit, P. (author)
In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is...
journal article 2014
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Maas, D. (author), Van Veldhoven, E. (author), Chen, P. (author), Sidorkin, V. (author), Salemink, H. (author), Van der Drift, E. (author), Alkemade, P. (author)
The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe [1,2]. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well...
conference paper 2009
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Marinescu, O. (author), Bociort, F. (author)
journal article 2008
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Marinescu, O. (author), Bociort, F. (author)
journal article 2008
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Nugrowati, A.M. (author)
In this thesis, we present applications in optics involving the diffraction theory of light for two advanced technologies. We have used a rigorous vectorial diffraction method to model: (i) the imaging of mask structures in extreme ultraviolet lithography, and (ii) ultrashort pulse propagation through small apertures. We have explained the...
doctoral thesis 2008
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Marinescu, O. (author), Bociort, F. (author)
The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when...
journal article 2007
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Bociort, F. (author), Van Turnhout, M. (author)
In present-day optical system design, it is tacitly assumed that local minima are points in the merit function landscapewithout relationships between them. We will show however that there is a certain degree of order in the design landscapeand that this order is best observed when we change the dimensionality of the optimization problem and when...
conference paper 2006
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Marinescu, O. (author), Bociort, F. (author)
Optical designers often insert or split lenses in existing designs. Here, we present, with examples from Deep and Extreme UV lithography, an alternative method that consists of constructing saddle points and obtaining new local minima from them. The method is remarkable simple and can therefore be easily integrated with the traditional design...
conference paper 2006
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Serebriakov, A.G. (author)
This thesis has been devoted to two main subjects: the compensation of birefringence induced by spatial dispersion (BISD) in Deep-UV lithographic objectives and the optimization of optical systems in general.
doctoral thesis 2005
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Bociort, F. (author), Van Turnhout, M. (author)
Finding multiple local minima in the merit function landscape of optical system optimization is a difficult task, especially for complex designs that have a large number of variables. We discuss here a method that enables a rapid generation of new local minima for optical systems of arbitrary complexity. We have recently shown that saddle points...
conference paper 2005
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Marinescu, O. (author), Bociort, F. (author)
The multidimensional merit function space of complex optical systems contains a large number of local minima that are connected via links that contain saddle points. In this work, we illustrate a method to construct such saddle points with examples of deep UV objectives and extreme UV mirror systems for lithography. The central idea of our...
conference paper 2005
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Serebriakov, A. (author), Bociort, F. (author), Braat, J. (author)
In the year 2001 it was reported that the birefringence induced by spatial dispersion (BISD), sometimes also called intrinsic birefringence, had been measured and calculated for fluorides CaF2 and BaF2 in the deep UV range. It was also shown that the magnitude of the BISD in these cubic crystals is sufficiently large to cause serious problems...
conference paper 2005
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Serebriakov, A. (author), Maksimov, E. (author), Bociort, F. (author), Braat, J. (author)
The subject of birefringence induced by spatial dispersion (BISD), also called intrinsic birefringence, recently became an important issue for 157-nm lithography. For the deep UV range, because of intrinsic absorption, only crystalline materials can be used as optical materials for lens manufacturing. The physical properties of crystals are...
conference paper 2004
Searched for: faculty:"Applied%5C%2BSciences"
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