Searched for: faculty%3A%22Applied%255C%252BSciences%22
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Kruit, A. (author), Van Staa, R. (author)
Document(en) uit de collectie Chemische Procestechnologie
report 1954
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Kruit, P. (author)
Lithography system comprising a light source producing a light beam directed to a mask (3) located in a mask level and an optical demagnifier (4-6) for demagnifying by a factor and focusing the beam. The light beam is focused on a converter element (8) for converting said beam in a further beam having a smaller wavelength than UV light. The beam...
patent 1998
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Kruit, P. (author), Mook, H.W. (author)
An electron microscope provided with an electron source; an energy-dispersive element; an accelerating tube; a plate mounted between the energy-dispersive element and the specimen, in which a selection slit is provided at right angles to the dispersive direction of the dispersive element; source imaging electron optics for obtaining an image of...
patent 2000
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Wieland, M.J.J. (author), Kampherbeek, B.J. (author), Kruit, P. (author)
An electron source provided with a substrate layer (17) and a semiconductor layer (16) with at least one tip (19), the substrate layer (17) being suitable for receiving light of a first wavelength and transmitting the light to the semiconductor layer (16) that is suitable to convert the light into electrons by a photo-electric effect, the...
patent 2002
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Kruit, P. (author), Van Aken, R.H. (author)
An electron optical device for, in use, creating negative spherical and chromatic aberration and reducing the energy spread in an electron beam travelling on an optical axis, including: at least one conducting plate substantially perpendicular to the optical axis with a first aperture having a first radius around said optical axis, a thin foil...
patent 2004
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Silvis-Cividjian, N. (author), Hagen, C.W. (author), Kruit, P. (author)
Electron-beam-induced deposition (EBID) is a versatile micro- and nanofabrication technique based on electron-induced dissociation of metal-carrying gas molecules adsorbed on a target. EBID has the advantage of direct deposition of three-dimensional structures on almost any target geometry. This technique has occasionally been used in focused...
journal article 2005
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Van Someren, B. (author), Van Bruggen, M.J. (author), Zhang, Y. (author), Hagen, C.W. (author), Kruit, P. (author)
journal article 2006
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Kruit, P. (author), Bezuijen, M. (author), Barth, J.E. (author)
The potential application of carbon nanotubes as electron sources in electron microscopes is analyzed. The resolution and probe current that can be obtained from a carbon nanotube emitter in a low-voltage scanning electron microscope are calculated and compared to the state of the art using Schottky electron sources. Many analytical equations...
journal article 2006
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Kruit, P. (author), Hagen, C.W. (author), Mulder, E.H. (author)
The invention relates 'to a micro X-ray source comprising a target acting as anode, and a cathode, which during operation interacts with the target and functions as electron source, wherein the target is embodied as a metal foil possessing a spot where the electrons from the electron source arrive, the metal foil being locally thinner at the spot.
patent 2006
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Kruit, P. (author)
The invention relates to a scanning transmission electron microscope comprising an electron source, an electron accelerator and deflection means for directing electrons emitted by the electron source at an object to be examined, and in addition a detector for detecting electrons coming from the object and, connected to the detector, a device for...
patent 2006
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Kruit, P. (author), Van Bruggen, M.J. (author)
patent 2006
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Kruit, P. (author), Ferreira, J.A. (author)
The invention relates to compensation device for a magnetic field generated through electric traction in a tram or train transport system that comprises an overhead line and rails, the overhead line and rails during operation being live, wherein a predetermined section of the overhead line and rails is provided with adjacent circuits, each of...
patent 2007
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Van Dorp, W.F. (author), Hagen, C.W. (author), Crozier, P.A. (author), Kruit, P. (author)
journal article 2008
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Van Someren, B. (author), Kruit, P. (author)
The invention relates to a method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means...
patent 2008
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Dokania, A.K. (author), Kruit, P. (author)
This paper reports the preliminary feasibility study of room temperature vulcanization (RTV) 566 for its application as a “spring” for in situ height adjustment in our proposed design for an array of Schottky emitters. The reliability of the RTV 566 is tested in terms of its viscoelastic properties for thicknesses of 95, 142, and 195 ?m. The...
journal article 2008
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Zhang, Y. (author), Barth, J.E. (author), Kruit, P. (author)
For multielectron beam systems with a single electron source, the outside beams need to be collimated before entering the individual microcolumns. As an alternative of the traditional multibeam source design where the broad beam from the source is collimated by a single lens, the broad beam can be first split in subbeams that are focused by a...
journal article 2008
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Slot, E. (author), Wieland, M.J. (author), de Boer, G. (author), Kruit, P. (author), Ten Berge, G.F. (author), Houkes, A.M.C. (author), Jager, R. (author), Van de Peut, T. (author), Peijster, J.J.M. (author), Steenbrink, S.W.H.K. (author)
MAPPER Lithography is developing a maskless lithography technology. The technology combines massively-parallel electron-beam writing with high speed optical data transport used in the telecommunication industry. The electron optics generates 13,000 electron beams that are focused on the wafer by electrostatic lens arrays which are manufactured...
conference paper 2008
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Bronsgeest, M.S. (author), Barth, J.E. (author), Swanson, L.W. (author), Kruit, P. (author)
Probe size, shape, and current are important parameters for the performance of all probe forming systems such as the scanning (transmission) electron microscope, the focused ion beam microscope, and the Gaussian electron beam lithography system. Currently, however, the relation between probe current and probe size is ill defined. The key lies in...
journal article 2008
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Kruit, P. (author), Van Dorp, W.F. (author), Hagen, C.W. (author), Crozier, P.A. (author)
journal article 2008
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Hagen, C.W. (author), Fokkema, E. (author), Kruit, P. (author)
The virtual source size of a liquid metal ion source is an order of magnitude larger than the size of the region from which the ions are emitted at the source. This source size has a direct effect on the reduced brightness and, hence, on the performance of these sources. The variation of the virtual source size of a gallium liquid metal ion...
journal article 2008
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