Residue-free plasma etching of polyimide coatings for small pitch vias with improved step coverage

The authors have found that patterning polyimide coatings containing organosilane adhesion promoter using pure oxygen plasma resulted in a thin silicon-rich residue layer. They show in this paper that adding small amounts of fluorine-containing gas to the etching gas mixture is necessary in order to achieve residue-free polyimide plasma etching....

A mesoscopic approach to the study of thin protective coatings by Positron Beam Analysis and Scanning Electron Microscopy

The study of thin protective coatings is one of the major research topics in the industry. Among the many questions in this wide topic, the aim of this thesis has been to contribute to the understanding of two of them: the problem of the adhesion and the role of porosity in thin films. The thin films studied in this work were mainly...