Searched for: subject%3A%22Alignment%22
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Slabbekoorn, K. (author)
The rise of the Semantic Web and Linked Open Data has led to a large number of different and heterogeneous datasets and ontologies published on the Web. This kind of heterogeneity of datasets has created a need to interlink them, i.e. to make explicit that two resources of different datasets in fact represent the exact same concept. This is the...
master thesis 2012
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Smeets, E.M.J. (author), Bijnen, F.C.G. (author), Slabbekoorn, J. (author), Van Zeijl, H.W. (author)
In the MEMS world, increasing attention is being given to 3D devices requiring dual-sided processing. This requires lithography tools that are able to align a wafer to both its back side as front side. Overlay describes how well front and back side layers are positioned with respect to each other. Currently there is no simple and fast method to...
conference paper 2004
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Van Zeijl, H.W. (author), Bijnen, F.G.C. (author), Slabbekoorn, J. (author)
To validate the Front- To Backwafer Alignment (FTBA) calibration and to investigate process related overlay errors, electrical overlay test structures are used that requires FTBA [1]. Anisotropic KOH etch through the wafer is applied to transfer the backwafer pattern to the frontwafer. Consequently, the crystal orientation introduces an overlay...
conference paper 2004