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Mountain, Christopher (author), Kluba, M.M. (author), Bergers, L.I.J.C. (author), Snijder, Jaap (author), Dekker, R. (author)
Accurate alignment between the cavities in cavity-SOI (c-SOI) wafers and lithography on the wafer surface is essential to advanced MEMS production. Existing alignment methods are well defined, but often require specialized equipment or costly software packages available only in professional manufacturing environments. It would be beneficial...
journal article 2019