Searched for: subject:"Atomic%5C%2Bforce%5C%2Bmicroscopy"
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Goossens, A.M. (author), Calado, V.E. (author), Barreiro, A. (author), Watanabe, K. (author), Taniguchi, T. (author), Vandersypen, L.M.K. (author)
Contamination of graphene due to residues from nanofabrication often introduces background doping and reduces electron mobility. For samples of high electronic quality, post-lithography cleaning treatments are therefore needed. We report that mechanical cleaning based on contact mode atomic force microscopy removes residues and significantly...
journal article 2012