Lugier, Olivier (author), Troglia, Alessandro (author), Sadegh, Najmeh (author), van Kessel, L.C.P.M. (author), Bliem, Roland (author), Mahne, Nicola (author), Nannarone, Stefano (author), Castellanos, Sonia (author) The semiconductor industry plans to keep fabricating integrated circuits, progressively decreasing there features size, by employing extreme ultraviolet lithography (EUVL). With this method, new designs and concepts for photoresist materials need to be conceived. In this work, we explore an alternative concept to the classic photoresist...
journal article 2020
