Searched for: subject%3A%22HSQ%22
(1 - 2 of 2)
document
Grigorescu, A.E. (author)
The continuous shrinking of the feature size forces scientists and engineers to develop new lithographic techniques and suitable materials which can meet the requirements of the market. Despite its low throughput, EBL remains the number one candidate when writing very small structures. Achieving ultimate resolution with EBL requires not only a...
doctoral thesis 2009
document
Grigorescu, A.E. (author), Van der Krogt, M. (author), Hagen, C.W. (author)
Isolated dots and lines with 6 nm width were written in 20 nm thick Hydrogen silsesquioxane (HSQ) layers on silicon substrates, using 100 keV electron beam lithography. The main factors that might limit the resolution, i.e. beam size, writing strategy, resist material, electron dose, development process, are discussed. We demonstrate that, by...
conference paper 2007