Ptychography as a wavefront sensor for high-numerical aperture extreme ultraviolet lithography: Analysis and limitations

Wavefront aberration measurements are required to test an extreme ultraviolet (EUV) imaging system. For a high-NA EUV imaging system, where conventional wavefront-sensing techniques show limitations, ptychography can be used for this purpose. However, at the wavelength region of EUV (i.e., 13.5 nm), the position accuracy of the scanning mask...