Tuning Nanopores in Tubular Ceramic Nanofiltration Membranes with Atmospheric-Pressure Atomic Layer Deposition: Prospects for Pressure-Based In-Line Monitoring of Pore Narrowing

Atomic layer deposition (ALD) is known for its unparalleled control over layer thickness and 3D conformality and could be the future technique of choice to tailor the pore size of ceramic nanofiltration membranes. However, a major challenge in tuning and functionalizing a multichannel ceramic membrane is posed by its large internal pore...

In Situ Annealing of Boron-Doped Amorphous Silicon Layers Using APCVD Technology

In this work, we developed an in situ annealing process to crystallize boron-doped amorphous silicon [a-Si(p+)] layers deposited by atmospheric pressure chemical vapour deposition (APCVD) to form boron-doped polycrystalline silicon [poly-Si(p+)] layers. The influence of the temperature profiles during a-Si(p+) inline deposition on structural,...

Microscale Atmospheric Pressure Plasma Jet as a Source for Plasma-Driven Biocatalysis

The use of a microscale atmospheric pressure plasma jet (μAPPJ) was investigated for its potential to supply hydrogen peroxide in biocatalysis. Compared to a previously employed dielectric barrier discharge (DBD), the μAPPJ offered significantly higher H₂O₂ production rates and better handling of larger reaction volumes....

Efficacy of Plasma Activation on Bleaching

This in vitro study aimed to evaluate the bleaching efficacy and color stability of nonthermal atmospheric pressure plasma (NAPP)-activated 40% hydrogen peroxide (HP) and deionized water (DW). Methods: Two hundred-forty bovine enamel−dentin samples were stained with a coffee solution before bleaching. Samples were randomly divided into 12 (n =...

Effect of Plasma-Activated Bleaching on Enamel Microhardness and Morphology

This in vitro study aimed to evaluate the effect of nonthermal atmospheric pressure plasma (NAPP)-activated hydrogen peroxide (HP) and deionized water (DW) on enamel microhardness and enamel surface morphology.<br/>

Atmospheric pressure atomic layer deposition for tight ceramic nanofiltration membranes: Synthesis and application in water purification

Tight ceramic nanofiltration (NF) membranes allow efficient separation of organic matter and ions for advanced water treatment. These membranes are typically produced by the sol-gel method. Recently, atomic layer deposition (ALD), a self-limiting gas phase coating technique, has been explored for membrane fabrication and modification. In this...

Gas-phase Deposition of Thin Aluminium Oxide Films at Ambient Conditions

Particles are widely used in the chemical industry as raw material and end product. In many applications of particles, it is advantageous to give them a coating that can either protect the particle from outside influences or give it an additional function. Technologies to provide micron-sized particles with relatively thick coatings (in the...

Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions

We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows coating heat-sensitive materials, while working at atmospheric pressure would simplify the scale-up of this process. We performed 4, 7 and 15...

Surface Modification of Titanium and Polyimide Sheet for Adhesive Bonding

Major industrial sectors like automotive, aerospace and others are increasingly using polymer composites in their structural parts. Polyimide sheet and adhesives, are high performance polymers. They are widely used in various engineering applications due to their excellent thermal, mechanical and chemical properties and their resistance to...

Hydrogen termination of CVD diamond films by high-temperature annealing at atmospheric pressure

A high-temperature procedure to hydrogenate diamond films using molecular hydrogen at atmospheric pressure was explored. Undoped and doped chemical vapour deposited (CVD) polycrystalline diamond films were treated according to our annealing method using a H2 gas flow down to ?50 ml/min (STP) at ?850?°C. The films were extensively evaluated by...

Atmospheric pressure plasma surface modification of titanium for high temperature adhesive bonding

In this investigation surface treatment of titanium is carried out by plasma ion implantation under atmospheric pressure plasma in order to increase the adhesive bond strength. Prior to the plasma treatment, titanium surfaces were mechanically treated by sand blasting. It is observed that the contact angle of de-ionized water decreases with the...

Novel contacts and diodes for advanced silicon technology