Towards osteogenic and bactericidal nanopatterns?

Recent discoveries have shown that nanopatterns with feature sizes ≤100 nm could direct stem cell fate or kill bacteria. These effects could be used to develop orthopedic implants with improved osseointegration and decreased chance of implant-associated infections. The quest for osteogenic and bactericidal nanopatterns is ongoing but no...

Core-Shell Plasmonic Nanohelices

We introduce core-shell plasmonic nanohelices, highly tunable structures that have a different response in the visible for circularly polarized light of opposite handedness. The glass core of the helices is fabricated using electron beam induced deposition and the pure gold shell is subsequently sputter coated. Optical measurements allow us...

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

To demonstrate the possibility of using EBID masks for sub-10 nm pattern transfer into silicon, first experiments were carried out by using 20-40 nm EBID masks, that were etched by different chemistries. It is experimentally verified that recipes based on hydrogen bromide, chlorine and boron trichloride can selectively etch silicon when using 20...

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Focused electron beam induced processing (FEBIP) of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor’s ligand...

Towards high purity nanostructures from electron beam induced deposition of platinum

Electron beam induced deposition (EBID) is a novel nanofabrication technique allowing the rapid prototyping of three-dimensional nanodevices and the metallic wiring of nanostructures, and is a promising technique for many applications in nanoresearch. EBID is a process wherein a precursor molecule containing the material to be deposited is...

Electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV): Total cross section as a function of incident electron energy

The total cross section has been measured for the electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV) [MeCpPt(IV)Me3], a Pt precursor often used in focused electron beam induced processing (FEBIP), for incident electron energies ranging between 3–3 keV. Measurements were performed for the precursor in the adsorbed...

Sub-10 nm focused electron beam induced deposition

Work started with a critical review of literature from the past 70-odd years. The review shows that the physical processes occurring in EBID are generally well understood. By combining models for electron scattering in a solid and electron beam induced heating and knowledge of growth regimes, the majority of the experimental results was...

Multi-electron beam system for high resolution electron beam induced deposition

The development of a multi-electron beam system is described which is dedicated for electron beam induced deposition (EBID) with sub-10 nm resolution. EBID is a promising mask-less nanolithography technique which has the potential to become a viable technique for the fabrication of 20-2 nm structures after 2013, as described by the International...