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Slot, E. (author), Wieland, M.J. (author), de Boer, G. (author), Kruit, P. (author), Ten Berge, G.F. (author), Houkes, A.M.C. (author), Jager, R. (author), Van de Peut, T. (author), Peijster, J.J.M. (author), Steenbrink, S.W.H.K. (author)
MAPPER Lithography is developing a maskless lithography technology. The technology combines massively-parallel electron-beam writing with high speed optical data transport used in the telecommunication industry. The electron optics generates 13,000 electron beams that are focused on the wafer by electrostatic lens arrays which are manufactured...
conference paper 2008